Process for the production and concentration of silica sols

Details Process for the production and concentration of silica sols Process for the production and concentration of silica sols

1993-05-10

1995-10-17

Lovering, Richard D.

Compositions

Preservative agents

Anti-corrosion

10628734, B01J 1300

Patent

active

054588120

ABSTRACT:
Process for the production and concentration of alkaline silica sols containing nonaggregated, spherical SiO.sub.2 particles with a diameter of .gtoreq.1 nm starting with SiO.sub.2 concentrations of 4-8% by weight, using microporous membrane filters.

REFERENCES:
patent: 2244325 (1941-06-01), Bird
patent: 2574902 (1951-11-01), Bechtold et al.
patent: 3440175 (1969-04-01), Weldes et al.
patent: 3440176 (1969-04-01), Sippel
patent: 3462374 (1969-08-01), Klosak
patent: 3673104 (1972-06-01), Albrecht
patent: 3947376 (1976-03-01), Albrecht
patent: 3969266 (1976-07-01), Iler
patent: 4336234 (1982-01-01), Leutner et al.
patent: 4806665 (1989-02-01), Jones et al.
patent: 4915870 (1990-04-01), Jones
patent: 5352277 (1994-10-01), Sasaki
Shugar et al., Chemical Technicians' Ready Reference Handbook, Second Edition, (McGraw-Hill, Inc., NY, N.Y., 1981) pp. 316-317.
Kirk-Othmer Encyclopedia of Chemical Technology, Third Edition, vol. 15, pp. 115, (John Wiley & Sons, NY, N.Y., 1983).
D. K. Iler, "The Chemistry of Silica", Wiley, New York, (1979).
G. W. Sears, Jr., "Determination of Specific Surface . . . Sodium Hydroxide", Analytical Chemistry, vol. 28, No. 12, Dec. 1956, pp. 1981-1983.

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