Refrigeration – Cryogenic treatment of gas or gas mixture – Solidification
Patent
1994-08-04
1996-04-30
Capossela, Ronald C.
Refrigeration
Cryogenic treatment of gas or gas mixture
Solidification
62 543, 62384, F25D 312
Patent
active
055113796
ABSTRACT:
An insulated chamber (1) for preservation and transportation comprises a container (2) of carbon dioxide snow provided with a lateral opening (5) permitting the injection, within the container, of liquid CO.sub.2 under pressure by a distribution device (10) connected to a source of liquid CO.sub.2 (6). The distribution device is provided with an electrovalve (18) controlled by a control block (19) comprising a timer permitting selecting the duration of injection of liquid CO.sub.2 into the container (2) to form there a controlled volume of carbon dioxide snow. The installation is useful for the preservation and transportation of fresh food products as well as frozen food products.
REFERENCES:
patent: 1876915 (1932-09-01), Gordon
patent: 2217169 (1940-10-01), Hill
patent: 2316423 (1943-04-01), Harvey et al.
patent: 3447336 (1939-06-01), Gramse
patent: 3468135 (1969-09-01), Doll et al.
patent: 3561226 (1971-02-01), Rubin
patent: 3861168 (1975-01-01), Sayers
patent: 3922878 (1975-12-01), Jalali
patent: 4299429 (1981-11-01), Franklin
patent: 4376511 (1983-03-01), Franklin
patent: 4377402 (1983-03-01), Crowe et al.
patent: 4415346 (1983-11-01), Love
patent: 4502293 (1985-03-01), Franklin
patent: 4704876 (1987-11-01), Hill
patent: 4891954 (1990-01-01), Thomsen
Bouguet Philippe
Gibot Claude
Capossela Ronald C.
Carboxyque Francaise
LandOfFree
Process for the preservation of products at low temperature in a does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for the preservation of products at low temperature in a, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the preservation of products at low temperature in a will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-621339