Specialized metallurgical processes – compositions for use therei – Compositions – Loose particulate mixture containing metal particles
Patent
1991-04-12
1992-09-08
Roy, Upendra
Specialized metallurgical processes, compositions for use therei
Compositions
Loose particulate mixture containing metal particles
75249, 419 12, 419 32, 428614, 428629, B23K 900, B22F 100
Patent
active
051455137
ABSTRACT:
A process for the preparation of composite materials consisting essentially of an oxide phase and a metal phase is effected by grinding a mixture of at least one oxide precursor of the metal phase of the composite with at least one reducing agent, the reducing agent being a precursor of the oxide phase. The grinding being performed in a high energy mechanical grinder for a sufficient length of time so that at least 80 percent of the oxide precursor is reduced to metal or to a metal alloy. The process is particularly valuable for the preparation of oxide/metal composite materials which have improved mechanical, electrical or radiation absorption properties.
REFERENCES:
patent: 3205099 (1965-09-01), Vordahl
patent: 3723092 (1973-03-01), Benjamin
patent: 4300947 (1981-11-01), Habesch, Jr. et al.
patent: 4649083 (1987-03-01), Fister et al.
patent: 4689077 (1987-08-01), Chevigne et al.
patent: 4689461 (1987-08-01), Gamberg
patent: 4749545 (1988-06-01), Begg et al.
patent: 4909840 (1990-03-01), Schlump
Fecht et al. Met. Trans. 21A (1990) 2333.
Grosse-Bauer Elizabeth
Le Caer Gerard
Matteazzi Paolo
Centre National de le Recherche Scientifique
Roy Upendra
LandOfFree
Process for the preparing via the in situ reduction of their com does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for the preparing via the in situ reduction of their com, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the preparing via the in situ reduction of their com will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-131777