Process for the preparation on enantiomerically enriched...

Organic compounds -- part of the class 532-570 series – Organic compounds – Carboxylic acid esters

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C560S060000, C562S470000

Reexamination Certificate

active

07002037

ABSTRACT:
The present invention relates to novel resolution methods, which are useful in the preparation of enantiomerically enriched intermediates which in their turn are useful in the prepartion of compounds with a pharmacological effect on the insulin resistance syndrome (IRS). It is such a process that the present inventions sets out to define, and more particularly for the preparation of the (S)-enantioner of certain 2-ethoxy-3-(4-hydroxyphenyl)propanoic acids and derivatives thereof.

REFERENCES:
patent: 5232945 (1993-08-01), Hulin
patent: 5306725 (1994-04-01), Sano et al.
patent: 6048883 (2000-04-01), Haigh et al.
patent: 6054453 (2000-04-01), Lohray et al.
patent: 6258850 (2001-07-01), Andersson
patent: 6362360 (2002-03-01), Andersson et al.
patent: 6630600 (2003-10-01), Andersson et al.
patent: 6660879 (2003-12-01), Andersson
patent: WO 9731907 (1997-09-01), None
patent: 9962870 (1999-12-01), None
Aitken et al., Synthesis, vol. 12, pp. 958-959 (1989).
Gramlich et al., Chem. Ber., vol. 112, pp. 1571-1584 (1979).
Sakamoto et al., Heterocycles, vol. 27, pp. 257-260 (1988).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for the preparation on enantiomerically enriched... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for the preparation on enantiomerically enriched..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the preparation on enantiomerically enriched... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3675596

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.