Process for the preparation of the parylene dimer

Details Process for the preparation of the parylene dimer Process for the preparation of the parylene dimer

1987-05-26

1989-02-21

Garvin, Patrick P.

Chemistry of hydrocarbon compounds

Aromatic compound synthesis

By condensation of entire cyclic molecules or entire...

585428, 585469, C07C 272

Patent

active

048067024

ABSTRACT:
An improved process is provided for the preparation of the dimer, 2,2-paracyclophane, which is useful as the starting material for parylene conformal coatings used in the electronics industry for the protection of various sensitive electronic components.
The process comprises optimization of the normally low yield of dimer formed by the Hofmann elimination reaction of p-methylbenzyltrimethylammonium halide by conducting the elimination reaction in the presence of dimethysulfoxide and certain reaction promoters.

REFERENCES:
patent: 4532369 (1985-07-01), Hartner
patent: 4675462 (1987-06-01), Ungarelli et al.
Hawley, G. G., The Condensed Chemical Dictionary, Van Nostrand Reinhold and Company, .COPYRGT. 1977, pp. 295, 419.

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