Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1983-05-11
1984-08-14
Cooper, Jack
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
502232, C01B 3312
Patent
active
044656572
ABSTRACT:
Process for preparing pure silicon dioxide from a hexafluorosilicic acid solution by controllably and vigorously admixing, stirring or blending a hexafluorosilicic acid solution with a quantity of ammonium hydroxide solution amounting to about 40 to about 75 percent by weight of the quantity stoichiometrically required for the converting hexafluorosilicic acid to ammonium fluoride and silicon dioxide to thereby form a reaction mixture and a precipitate therein; separating out this precipitate; treating the precipitate-free liquid with ammonium hydroxide and then recovering the pure silicon dioxide. The silicon dioxide is pure enough to be useful as a catalyst support or as a substitute for quartz.
REFERENCES:
patent: 3271107 (1966-09-01), Nickerson et al.
patent: 4298586 (1981-11-01), Sikdar
patent: 4308244 (1981-12-01), Sikdar et al.
Cooper Jack
Unie van Kunstmestfabrieken B.V.
LandOfFree
Process for the preparation of pure silicon dioxide and silicon does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for the preparation of pure silicon dioxide and silicon , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the preparation of pure silicon dioxide and silicon will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-113790