Coating apparatus – Gas or vapor deposition – With treating means
Patent
1984-09-07
1986-04-08
Plantz, Bernard F.
Coating apparatus
Gas or vapor deposition
With treating means
118724, 118732, 118733, 427237, 4272552, C23C 1646
Patent
active
045805245
ABSTRACT:
A chemical vapor deposition (CVD) process for preparing fiber-reinforced ceramic composites. A specially designed apparatus provides a steep thermal gradient across the thickness of a fibrous preform. A flow of gaseous ceramic matrix material is directed into the fibrous preform at the cold surface. The deposition of the matrix occurs progressively from the hot surface of the fibrous preform toward the cold surface. Such deposition prevents the surface of the fibrous preform from becoming plugged. As a result thereof, the flow of reactant matrix gases into the uninfiltrated (undeposited) portion of the fibrous preform occurs throughout the deposition process. The progressive and continuous deposition of ceramic matrix within the fibrous preform provides for a significant reduction in process time over known chemical vapor deposition processes.
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Caputo Anthony J.
Lackey, Jr. Walter J.
Hamel Stephen D.
Hightower Judson R.
Larcher Earl L.
Plantz Bernard F.
The United States of America as represented by The United States
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