Organic compounds -- part of the class 532-570 series – Organic compounds – Unsubstituted hydrocarbyl chain between the ring and the -c-...
Patent
1997-03-19
1999-05-04
Shah, Mukund J.
Organic compounds -- part of the class 532-570 series
Organic compounds
Unsubstituted hydrocarbyl chain between the ring and the -c-...
540536, C07D20104
Patent
active
059004827
ABSTRACT:
The present invention provides a method for producing .epsilon.-caprolactam, which comprises subjecting cyclohexene to a hydration reaction to obtain cyclohexanol, subjecting the cyclohexanol to a dehydrogenation reaction to obtain cyclohexanone, subjecting the cyclohexanone to an oxime-forming reaction to obtain cyclohexanone oxime, and subjecting the cyclohexanone oxime to a Beckmann rearrangement reaction to obtain .epsilon.-caprolactam, wherein methylcyclopentanones contained in the cyclohexanone subjected to the oxime-forming reaction are controlled to be not more than 400 ppm.
According to the present invention, it is possible to produce .epsilon.-caprolactam having a quality not inferior to conventional quality at a low cost.
REFERENCES:
patent: 4140685 (1979-02-01), Goettsch et al.
patent: 4457807 (1984-07-01), Rulkens et al.
Patent Abstracts of Japan, JP-8-176102, Jul. 9, 1996.
Patent Abstracts of Japan, JP-8-193061, Jul. 30, 1996.
Patent Abstracts of Japan, JP-8-193062, Jul. 30, 1996.
Patent Abstracts of Japan, JP-8-198845, Aug. 6, 1996.
Patent Abstracts of Japan, JP-5-301858, Nov. 16, 1993.
Kanda Yu
Sano Hidefumi
Teramoto Kouji
Tezuka Makoto
Uchibori Toshio
Kifle Bruck
Mitsubishi Chemical Corporation
Shah Mukund J.
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