Chemistry of carbon compounds – Miscellaneous organic carbon compounds – C-metal
Patent
1974-03-01
1976-08-31
Higel, Floyd D.
Chemistry of carbon compounds
Miscellaneous organic carbon compounds
C-metal
260155, 260156, 260157, 260158, 260174, 260196, 260207, 2602071, 260208, C09B 4300, D06P 352, D06P 354
Patent
active
039780406
ABSTRACT:
Preparation of azo dyestuffs which possess at least one nitrile group in the ortho-position to the azo bridge, by reacting the corresponding ortho-halogenoazo compounds with CuCN or systems which for CuCN, in the presence of nitrogen bases and optionally of surface-active agents, in an aqueous medium, with replacement of at least one halogen substituent, which is in the orthoposition to the azo bridge, by a nitrile group. Preferably the reaction is carried out as one-pot-process. The dyestuffs prepared by the process, a substantial number of which are known, are useful in dyeing natural and synthetic fiber materials.
REFERENCES:
patent: 1725596 (1929-08-01), Pongrantz
patent: 2128684 (1938-08-01), Vollmann et al.
patent: 2195076 (1940-03-01), Braun et al.
patent: 3259646 (1966-07-01), Harris et al.
patent: 3342804 (1967-09-01), Mueller
patent: 3393191 (1968-07-01), Mueller
patent: 3407189 (1968-10-01), Merian
patent: 3574183 (1971-04-01), Kruckbnberg
patent: 3772267 (1973-11-01), Cornelius et al.
patent: 3821195 (1974-06-01), Putzig
patent: 3876621 (1975-04-01), Hagen et al.
Bacon et al., J. Chem. Soc. (London), Vol. of 1964, pp. 1097-1107.
Gottschlich Alois
Leverenz Klaus
Moritz Karl-Ludwig
Bayer Aktiengesellschaft
Higel Floyd D.
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