Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1990-12-28
1993-02-02
Chaudhuri, Olik
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
423332, C01B 3332
Patent
active
051836513
ABSTRACT:
To prepare crystalline sodium silicates having a layer structure and the formula Na.sub.2 Si.sub.x O.sub.2x+1, in which x is between 2 and 3, sand and soda are first fused in a molar ratio of SiO.sub.2 /Na.sub.2 O of 2 to 3.5 at temperature of 1200.degree. to 1400.degree. C. The water-glass obtained in pieces after the melt has cooled is ground to particle sizes of less than 2 mm before it is treated at temperatures of 600.degree. to 800.degree. C. for 10 to 120 minutes in an elongated reaction zone with mechanical circulation. Finally, the material leaving the reaction zone is ground to a particle fineness of less than 1 mm.
REFERENCES:
patent: 1119720 (1914-12-01), Paterson
patent: 3203755 (1965-08-01), Rathmell
patent: 4585642 (1986-04-01), Rieck
Glastechnische Berichte, 37. Jahrgang, Heft 4, (1964) pp. 194-200.
Gradl Reinhard
Kotzian Michael
Schimmel Gunther
Chaudhuri Olik
Hoechst Aktiengesellschaft
Horton Ken
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