Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1986-06-11
1989-02-21
McFarlane, Anthony
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
423333, 423DIG5, 23295R, 23300, 23302T, C01B 3332
Patent
active
048063274
ABSTRACT:
A process for the preparation of a crystalline sheet-type alkali metal silicate is described, in which an aqueous solution of an alkali metal silicate or a suspension of an amorphous alkali metal silica having a molar ratio M.sub.2 O (unneutralized)/SiO.sub.2, where M represents an alkali metal, of 0.05:1 to 0.8:1 is allowed to react at temperatures of 70.degree. to 250.degree. C. until the sheet-type alkali metal silicate crystallizes out. After the beginning of crystallization, an acidic compound is added in an amount such that an M.sub.2 O (unneutralized)/SiO.sub.2 ratio of 0.05:1 to 0.8:1 is constantly maintained in the mother liquor of a filtered sample. However, at least an amount corresponding to 5 milliequivalents of H.sup.+ per mole of SiO.sub.2 in the alkali metal silicate used is added. The use of seed crystals of the desired sheet silicate is advantageous.
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Leon McCullich, J. Amer. Chem. Soc., 74, 2453-2456 (1952), "A New Highly Silicious Soda-Silica Compound".
Klaus Beneke et al., American Mineral, 68, 818-826 (1983), "Kenyaite-Synthesis and Properties".
Rieck Hans-Peter
Schott Martin
Hoechst Aktiengesellschaft
McFarlane Anthony
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