Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1985-01-02
1986-03-25
Doll, John
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
423326, 423327, 423328, 423329, 423330, 423332, 423333, C01B 3320
Patent
active
045782580
ABSTRACT:
A process for the preparation of a crystalline sheet-type alkali metal silicate in an aqueous medium is described, in which an acidic compound is added to an amorphous alkali metal silicate, or an alkali metal silicate dissolved in water, having a molar ratio M.sub.2 O/SiO.sub.2 (M=alkali metal) of 0.24 to 2.0, in an amount such that a molar ratio M.sub.2 O (unneutralized)/SiO.sub.2 of 0.05 to 0.239 is obtained. If required, the molar ratio SiO.sub.2 /H.sub.2 O is adjusted from 1:5 to 1:100 by dilution, and the reaction mixture is kept at a reaction temperature of 70.degree. to 250.degree. C. until the sheet-type alkali metal silicate has crystallized out.
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Doll John
Hoechst Aktiengesellschaft
Leeds Jackson
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