Process for the preparation of an optical structure and optical

Details Process for the preparation of an optical structure and optical Process for the preparation of an optical structure and optical

1993-11-08

1994-09-27

Beck, Shrive

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

427569, 427162, 427164, 4272551, 427322, 4274192, B05D 506

Patent

active

053506057

ABSTRACT:
The invention concerns the preparation of an optical structure. On a polymeric substrate there is first provided a surface activation, and the deposit of a layer of SiO.sub.2, 2000 .ANG. thick after which there is a deposit of a plurality of functional layers and finally a deposit of SiO.sub.2, 3 microns thick followed by a deposit of Si.sub.3 N.sub.4 /SiO.sub.x N.sub.y 3 microns thick, the latter being produced under radio-frequency polarization. The thus obtained optical structure has properties of adhesiveness, resistance to abrasion and to thermal impacts.

REFERENCES:
patent: 4927704 (1990-05-01), Reed et al.
patent: 5093152 (1992-03-01), Bonet et al.

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