Process for the photochemical vapor deposition of hetero-linked

Details Process for the photochemical vapor deposition of hetero-linked Process for the photochemical vapor deposition of hetero-linked

1984-11-26

1985-10-15

Newsome, John H.

Coating processes

Electrical product produced

Welding electrode

20415911, 252500, B05D 512

Patent

active

045473951

ABSTRACT:
A low temperature photochemical vapor deposition process for the deposition of a layer of a chosen polymer on the surface of a substrate. The polymer comprises repeating hydrocarbon units linked through oxygen, nitrogen, or sulfur atoms and is formed by reacting a vapor phase monomer precursor containing the hydrocarbon units and a vapor phase precursor containing the oxygen, nitrogen, or sulfur under radiation inducement. The low temperature of the process avoids thermal damage to the substrate. Specifically disclosed polymers are polyphenylether and polyxyleneamine, which are useful, respectively, as insulator or passivation layers in semiconductor devices and circuits, and as adhesives.

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patent: 3959101 (1976-05-01), Staniland et al.
patent: 4330570 (1982-05-01), Giuliani et al.
patent: 4363829 (1982-12-01), Seshimoto et al.

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