Process for the photochemical treatment of a material using a fl

Details Process for the photochemical treatment of a material using a fl Process for the photochemical treatment of a material using a fl

1992-03-31

1993-06-22

Pianalto, Bernard

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

427250, 4272552, 4272553, 427444, 427535, 427553, 427557, 427558, 427574, 427579, 427583, 427584, 427585, 427595, B05D 302

Patent

active

052215610

ABSTRACT:
The process for the photochemical treatment of a solid material consists of exposing the latter to light pulses produced by at least one glow discharge elongated tube (4) having a rare gas under low pressure and whereof the gas, the pressure and the characteristics of the discharge are adapted to said material and its precursors, each pulse containing an extensive emission spectrum between 160 and 5000 nm. An electrical circuit with modulatable electrical characteristics (LC) makes it possible to modulate the discharge characteristics of the tube and the storage of the energy necessary for said discharge.

REFERENCES:
patent: 4702936 (1987-10-01), Maeda et al.
Journal of Applied Physics, vol. 64(5) (Fukuki et al.), pp. 2380-2383, May 1988, Deposition of High-quality a-Si:H direct photodecomposition.
Instruments and Experimental Techniques (Yu. G. Basov) pp. 1239-1266, Dec. 1986, Flashlamp Pumping Systems for Dye Lasers.
Instruments and Experimental Techniques (Krymskii et al.), pp. 219-220, Feb. 1975, A Coaxial Lamp for Flash Photolysis.
Journal of Applied Physica, vol. 64(6) (Kawasaki et al.), pp. 3254-3264, Jun. 1988, Study on the Early Stage of Photochemical Vapor Deposition.
Material Science Reports (Hanabusa) pp. 53-59, May 1987, Photoinduced Deposition of Thin Films.
Applied Physics Letter vol. 36(1) (Juh Tseng Lue) pp. 73-76, Oct. 1979 Arc Annealing of BF.sup.+.sub.2 Implanted Silicon by a Short Pulse Flash Lamp.

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