Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
Patent
1987-10-13
1989-05-30
Pianalto, Bernard
Coating processes
Electrical product produced
Integrated circuit, printed circuit, or circuit board
427 58, B05D 306
Patent
active
048350060
ABSTRACT:
A process for the passivation of crystal defects or grain boundaries or internal grain defects or surfaces in an electrically conductive material in a plasma, where the passivation is carried out by the influence of suitable ions on the electrically conductive material to facilitate a shorter process time and lower stress on the electrically conductive material. A high-frequency gas discharge plasma is acted upon by a superimposed d.c. voltage which serves to accelerate the ions, suitable to carry out the passivation, towards the electrically conductive material.
REFERENCES:
patent: 4152478 (1979-05-01), Takagi
patent: 4343830 (1982-08-01), Sarma et al.
Applied Phys. Ltr., vol. 47, No. 2, 7/85, Cannavo et al., pp. 138-140.
Journal of Applied Phys., vol. 57, No. 12, 5/85, Hwang et al., pp. 5275-5278.
Japanese Journal of Applied Phys., vol. 22, No. 1, 1/83, Matsuda et al., pp. L34-L36.
Patent Abstracts of Japan, vol. 6, No. 189, 9/28/82, No. 57-102027.
IEEE Journal, vol. EDL-6, No. 3, 3/85, Singh et al., pp. 139-141.
Applied Phys. Ltr., vol. 35, No. 7, 10/79, Makino et al., pp. 551-552.
Applied Phys. Ltr., vol. 41, No. 11, 12/82, Lagowski et al., pp. 1078-1080.
Grasser Heinrich
Muenzer Adolf
Moran John F.
Pianalto Bernard
Siemens Aktiengesellschaft
LandOfFree
Process for the passivation of crystal defects does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for the passivation of crystal defects, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the passivation of crystal defects will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2151442