Process for the manufacture of pyridine in high yield and select

Details Process for the manufacture of pyridine in high yield and select Process for the manufacture of pyridine in high yield and select

1988-06-06

1989-09-12

Lee, Mary C.

Organic compounds -- part of the class 532-570 series

Organic compounds

Heterocyclic carbon compounds containing a hetero ring...

546251, C07D21308

Patent

active

048661791

ABSTRACT:
An improved method of catalytic gaseous chemical synthesis of pyridine by reaction of ammonia and a carbonyl compound, preferably with added hydrogen, is described herein. The process employs as the catalyst a crystalline aluminosilicate zeolite which has been ion exchanged with a Group VIII metal of the Periodic Table. The preferred metal is palladium. Suitably, the Group VIII metal is present in an amount of about 0.01% to 5% by weight of the catalyst, preferably 0.1% to 2%. The crystalline aluminosilicate zeolite catalyst suitably has a silica to alumina mole rate of at least 15, preferably 30 to 200, and optimally, about 120 to 150. The process of the invention provides a high and selective yield of pyridine over a prolonged reaction period, and affords facile restorability of the catalyst.

REFERENCES:
patent: 3272825 (1966-09-01), Shimitzu et al.
patent: 3728408 (1973-04-01), Tobias
patent: 4220783 (1980-09-01), Chang et al.
patent: 4675410 (1987-06-01), Feitter et al.
patent: 4701529 (1987-10-01), Swearingen et al.
Journal of Catalysis, vol. 67, pp. 218-221 (1981).

Affiliated with

Also associated with

Rating

Process for the manufacture of pyridine in high yield and select does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for the manufacture of pyridine in high yield and select, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the manufacture of pyridine in high yield and select will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-917797