Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1979-08-30
1981-04-28
Cooper, Jack
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
423338, 423340, C01B 3312
Patent
active
042645646
ABSTRACT:
A process is herein described for the manufacture of high purity, granular silicic acid from aqueous alkali metal silicate solutions by acidification thereof, freezing and subsequently thawing the reaction mixture, and filtering, washing and drying the insoluble residue formed, in which the alkali metal silicate solutions have a molar ratio of SiO.sub.2 :Me.sub.2 O of from about 2:1 to 20:1, Me representing an alkali metal, and before freezing the aqueous alkali metal silicate solutions are adjusted to a pH value in the range of from about 2.5 to 6 and to a SiO.sub.2 content of from about 1 to 10 percent by weight by means of one or more aqueous solutions or suspensions of organic acids which complex aluminum, titanium, and iron ions and which form soluble alkali metal salts under the conditions of the process.
REFERENCES:
patent: 3433593 (1969-03-01), Remhardt et al.
Freyhold Helmut v.
Friedemann Wolfgang
Koster Alfred
Pesch Wolfgang
Cooper Jack
Henkel Kommanditgesellschaft auf Aktien
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