Process for the manufacture of extremely pure monoethylene glyco

Details Process for the manufacture of extremely pure monoethylene glyco Process for the manufacture of extremely pure monoethylene glyco

1981-01-09

1982-09-14

Bascomb, Jr., Wilbur L.

Distillation: processes, separatory

With chemical reaction

Including step of adding catalyst or reacting material

203 36, 203 37, 203 38, 203 71, 568867, 568868, B01D 334, C07C 2980, C07C 3120

Patent

active

043494170

ABSTRACT:
Ethylene oxide and water are reacted in a reactor and the reaction product is subjected to distillation in a plurality of distillation columns, in the first columns water and components having a boiling point below that of monoethylene glycol and higher ethylene glycols, if any, being distilled off. To obtain extremely pure monoethylene glycol alkali metal compounds are added at a point between the reactor and the monoethylene glycol distillation column in an amount to adjust the pH of the product entering the latter column to a value of from 7 to 10. The monoethylene glycol obtained in this manner is especially pure and has very low UV absorption values. It is, therefore, especially suitable for the manufacture of polyester fibers.

REFERENCES:
patent: 2788373 (1957-04-01), Mills et al.
patent: 2793235 (1957-05-01), Jenkinson
patent: 3408268 (1968-10-01), Pitts et al.
patent: 3875019 (1975-04-01), Cocuzza et al.
patent: 3904656 (1975-09-01), Broz
patent: 3970711 (1976-07-01), Reiche et al.
patent: 4225394 (1980-09-01), Cox et al.

Affiliated with

Also associated with

Rating

Process for the manufacture of extremely pure monoethylene glyco does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for the manufacture of extremely pure monoethylene glyco, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the manufacture of extremely pure monoethylene glyco will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2153855