Process for the lithographic manufacture of electroformable micr

Details Process for the lithographic manufacture of electroformable micr Process for the lithographic manufacture of electroformable micr

1989-12-18

1991-09-03

Welsh, David

Radiation imagery chemistry: process, composition, or product th

Plural exposure steps

430320, 430322, 355 39, 355 52, G03C 506, G03C 500

Patent

active

050454390

ABSTRACT:
A process for the lithographic manufacture of electroformable microstructure having a triangular or trapezoidal cross-section from a resist material.
A composite body is provided which is comprised of a layer of resist material on an electrically conductive substrate. The resist layer is irradiated to form irradiated band regions in the resist layer by conducting a first irradiation in which the substrate having the resist layer thereon is positioned at an angle of +.alpha. relative to a plane orthogonal to the incident radiation to form a first set of band-shaped regions, and a second irradiation in which the substrate is positioned at an angle of -.alpha. relative to a plane orthogonal to the incident radiation to form a second set of band-shaped regions which overlap the first set at the interface between the resist layer and the substrate. The irradiated regions of the resist layer are developed to produce microstructures.

REFERENCES:
patent: 4264714 (1981-04-01), Trausch
patent: 4935334 (1990-07-01), Boettiger et al.
J. Mohr et al., KfK 4414, Analyse der Defektursachen and der Genauigkeit der Strukturubertragung bei der Rontgentiefenlithographie mit Synchrotronstrahlung.

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