Process for the formation of phosphosilicate glass coating

Details Process for the formation of phosphosilicate glass coating Process for the formation of phosphosilicate glass coating

1987-06-23

1988-11-01

Childs, Sadie

Coating processes

Coating by vapor, gas, or smoke

Mixture of vapors or gases utilized

427 99, 437235, 437240, C23C 1630

Patent

active

047819456

ABSTRACT:
A coating of phosphosilicate glass is deposited on a substrate by a chemical vapor deposition method, using a reaction gas consisting of monosilane, phosphine, and oxygen, in admixture with ammonia gas. According to this deposition process, the undesirable formation and adhesion of particulate by-products such as SiO.sub.2, P.sub.2 O.sub.5, and H.sub.2 SiO.sub.3 to the substrate surface can be effectively prevented, and the step coverage can be improved.

REFERENCES:
patent: 4178877 (1979-12-01), Kudo
patent: 4282270 (1981-08-01), Nozaki et al.
patent: 4451969 (1984-06-01), Chaudhuri
patent: 4513026 (1985-04-01), Miyamoto et al.

Affiliated with

Also associated with

Rating

Process for the formation of phosphosilicate glass coating does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for the formation of phosphosilicate glass coating, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the formation of phosphosilicate glass coating will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-890216