Process for the formation of a barrier layer on a surface of a g

Details Process for the formation of a barrier layer on a surface of a g Process for the formation of a barrier layer on a surface of a g

1993-09-02

1995-07-11

Jones, W. Gary

Glass manufacturing

Processes

With coating

65 608, 427167, 4272552, C23C 1634

Patent

active

054317070

ABSTRACT:
There is formed a silicon-base antimigration barrier layer by projection, on a hot surface of a glass object, in an unconfined ambient atmosphere from a gaseous mixture comprising neutral gas, a silicon precursor, typically a silane, between 10 and 60% of ammonia and preferably less than 5% oxygen, the ratio of the oxygen and silane contents being comprised between 0 and 4. It is useful particularly for the treatment of sodium-calcium glass receptacles to prevent migration of ions into liquids contained in the receptacles.

REFERENCES:
patent: 3652331 (1972-03-01), Yamazaki
patent: 3717498 (1973-02-01), Franz
patent: 4100330 (1978-07-01), Donley
patent: 4188444 (1980-02-01), Landau
patent: 4543271 (1985-04-01), Peters
patent: 4780372 (1988-10-01), Tracy
patent: 4781945 (1988-11-01), Nishimura
patent: 4828880 (1989-05-01), Jenkins
patent: 4992309 (1991-02-01), Hochberg
patent: 4995893 (1991-02-01), Jenkins
patent: 5162136 (1992-10-01), Blum
Tooley, Fay, The Handbook of Glass Manufacture, 1984, pp. 18-1 to 18-5.

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