Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2006-12-26
2006-12-26
Rosasco, S. (Department: 1756)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
Reexamination Certificate
active
07153613
ABSTRACT:
The invention relates to a process for the fabrication of an optical fiber-processing phase mask that is reduced in terms of pitch variations on the mask and stitching errors, and provides a process for the fabrication of a chirped type optical fiber-processing phase mask wherein a grating form of grooves provided in one surface of a quartz substrate is configured as an optical fiber-processing grating pattern. At an exposure step, writing data obtained by arranging and compiling a plurality of data for a repetitive groove-and-strip pattern while the pitch of repetition is modulated are used and an electron beam resist is provided on a phase mask blank, so that writing is carried out all over the writing area on said phase mask blank continuously in a vertical direction to said grating form of grooves.
REFERENCES:
patent: 6072926 (2000-06-01), Cole et al.
patent: 2002/0028390 (2002-03-01), Mazed
patent: 2003/0006212 (2003-01-01), Segawa et al.
patent: 0602829 (1994-06-01), None
patent: 0606726 (1994-07-01), None
patent: 0936505 (1999-08-01), None
patent: 11-72631 (1999-03-01), None
patent: WO163325 (2001-08-01), None
Patent Abstracts of Japan Vo. 1999, No. 8, Jun. 30, 1999 & JP 11 072631 & EP 0940 695.
Patent Abstracts of Japan vol. 1997, No. 7, Jul. 31, 1997 & JP 09 080738.
Tennant D M: “Characterizationof Near-field holography grating masks for optoelectronicsfabricated by electron beam lithography”, Journal of Vacuum Science & Technology: Part B, American Instutite of Physis, New Yor, US, vol. 10, No. 6, Nov. 1, 1992, pp. 2530-2535.
Fujimoto Shigekazu
Inui Tetsuro
Komukai Tetsuro
Kurihara Masa-aki
Dai Nippon Printing Co. Ltd.
Nippon Telegraph and Telephone Corporation
Patenttm.us
Rosasco S.
Walters James H.
LandOfFree
Process for the fabrication of a phase mask for optical... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for the fabrication of a phase mask for optical..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the fabrication of a phase mask for optical... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3654353