Process for the disproportionation of chlorosilanes

Details Process for the disproportionation of chlorosilanes Process for the disproportionation of chlorosilanes

1985-09-10

1986-09-23

Dixon, Jr., William R.

Chemistry of inorganic compounds

Silicon or compound thereof

Halogen containing

423341, 423347, C01B 33107

Patent

active

046134891

ABSTRACT:
The process of disproportionation of chlorosilanes in the presence of a dried catalyst which is dried by heating up to 200.degree. C. under vacuum starting from a water-containing anion exchange cross-linked resin matrix containing as a functional group and said resin matrix stable at temperatures up to about 200.degree. C. without separation of the functional group from the resin matrix to produce the disproportionated product of high purity, semiconductor grade, without any contamination from the catalyst.

REFERENCES:
patent: 3044845 (1962-07-01), Jex et al.
patent: 3928542 (1975-12-01), Bakay
patent: 3968199 (1976-07-01), Bakay
patent: 4018871 (1977-04-01), Marin et al.
patent: 4113845 (1978-09-01), Litteral
patent: 4395389 (1983-07-01), Seth

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