Hazardous or toxic waste destruction or containment – Containment – Solidification – vitrification – or cementation
Patent
1996-09-18
1998-01-20
Mai, Ngoclan
Hazardous or toxic waste destruction or containment
Containment
Solidification, vitrification, or cementation
588202, 588227, 110346, A62D 300
Patent
active
057110174
ABSTRACT:
Chemical agents, such as chemical munitions, are decomposed by bringing them into contact with a plasma arc of a DC plasma arc furnace operated at a temperature of greater than about 30,000.degree. F.
REFERENCES:
patent: 1492241 (1924-04-01), Carpenter et al.
patent: 1515616 (1924-11-01), Poppenhusen
patent: 1715262 (1929-05-01), White
patent: 2049633 (1936-08-01), Thomsen
patent: 2756044 (1956-07-01), Neumann
patent: 2826490 (1958-03-01), Neumann
patent: 3561684 (1971-02-01), Fischer
patent: 3940551 (1976-02-01), Ling et al.
patent: 3999000 (1976-12-01), Stenkvist
patent: 4102676 (1978-07-01), Jaquay
patent: 4115109 (1978-09-01), Libach et al.
patent: 4177061 (1979-12-01), Stenkvist et al.
patent: 4180251 (1979-12-01), Jaquay
patent: 4229271 (1980-10-01), Prengaman et al.
patent: 4310351 (1982-01-01), Lieberman
patent: 4340421 (1982-07-01), Bergsoe
patent: 4431612 (1984-02-01), Bell et al.
patent: 4571261 (1986-02-01), Buren et al.
patent: 4644877 (1987-02-01), Barton et al.
patent: 4877640 (1989-10-01), Muehlberger et al.
patent: 5122181 (1992-06-01), Dube et al.
patent: 5138959 (1992-08-01), Kulkarni
patent: 5203908 (1993-04-01), Lindsay et al.
patent: 5284503 (1994-02-01), Bitler et al.
patent: 5439498 (1995-08-01), Bitler et al.
patent: 5584071 (1996-12-01), Kalyon et al.
"Energy-Saving DC Twin Shell Arc Furnace For Melting Low-Grade Scrap", ABB Review (Sep./Oct. 1996).
Chalfant, "Recovering Zinc and Iron From Electric-Furnace Dust", New Steel, p. 91, Sep. 1996.
Mintek, Application Report No. 11, "The Development, Up to Industrial Scale, of a Transferred Plasma-Arc Smelting Process for the Production of Ferro-Alloys" (1991).
Pyromet/Mintek, "Hollow Graphite Electrode D.C. Arc Furnace and Recovery Plant for Treatment of Steel Plant Dust" (1991).
Mintek, Technology International, "Safe Disposal of Environmentally Unacceptable Dust" (1991).
Wang et al, "Recovering Zn, Pb, Cd and Fe from Electric Furnace Dust", Journal of Metallurgy, pp. 42-45, Apr. 1990.
Bunney et al, "The Commercial Development of Plasma Technology: EAF Dust Application", AIME Conference, San Diego, Mar. 1992.
Erriksson, "The Plasmazinc Process for Recovery of Zince from Primary and Secondary Materials", Zinc '85, Ch. 52, pp. 827-839 (1985).
Bygden et al, "Application of Kellogg's Model to the Slag-Fuming Practice in Sweden", Zinc '85, Ch. 11, pp. 171-183 (1985).
Penberthy, "Why Glass is a good Host for Hazardous Waste", Glass Industry, pp. 22-24, May 1992.
Roy, "Cyclone Furnace Destroys Organics, Immobilizes Heavy Metals, Radionuclides", Hazmat World, pp. 59-60 (Aug. 1992).
"Waste Minimization--Selected Topics", The Hazardous Waste Consultant, pp. 1.22-1.24 (Sep./Oct. 1991).
Plasma Gasification Could Set New Standards For Municipal Solid Waste Disposal, Enersearch, Ontario Ministry of Energy (1986).
"Appliation of Plasma Technology in the Environmental Waste Processing Industry", CMP Report No. 92-5 (Jul. 1992).
Plasma Arcs Sputter New Waste Treatment, Chemical Engineering, pp. 32-35 (Dec. 1991).
Royer et al, "Control TEchnologies for REmediation of Contaminated Soil and Waste Deposits at Superfund Lead Battery Recycling Sites", J. Air Waste Manage. Assoc., pp. 970-980, 1992.
Baranski John P.
Bitler John A.
Larson Harold R.
Exide Corporation
Mai Ngoclan
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