Process for the deposition of structured metallic coatings on gl

Details Process for the deposition of structured metallic coatings on gl Process for the deposition of structured metallic coatings on gl

1992-07-30

1998-05-12

Padgett, Marianne

Coating processes

Direct application of electrical, magnetic, wave, or...

Chemical deposition from liquid contiguous with substrate...

427597, 427 98, 427307, B05D 306, B05D 512, C23C 1814

Patent

active

057502129

ABSTRACT:
This invention relates to a process for the application of conducting metallic, structured coatings on glass substrates, for example, for the manufacture of integrated circuits. The invention relies on placing a negative mask of the structure to be applied into the beam path of an excimer laser. After leaving the mask, the laser beam is directed onto a flat silica glass slice, the back side of which is in contact with a reductive copper bath. The process according to this invention requires exposure times no longer than seconds, after which the process proceeds autocatalytically. It can be stopped as soon as the desired coating thickness has been attained.

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patent: 5100693 (1992-03-01), Eisch et al.
patent: 5171608 (1992-12-01), Green et al.
Translation of Esrom, EPO 0,349,946 Jan. 1990.
Translation of Nippon Electric, KK 59-155,922 Sep. 1984.

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