Process for the deposition of high temperature stress and oxidat

Details Process for the deposition of high temperature stress and oxidat Process for the deposition of high temperature stress and oxidat

1990-05-21

1991-07-30

Lusignan, Michael

Coating processes

Coating by vapor, gas, or smoke

Base includes an inorganic compound containing silicon or...

4272551, 4272552, 4272553, 4271263, 4271262, 4274192, C23C 1600, B05D 136

Patent

active

050359231

ABSTRACT:
A process for depositing a high temperature stress and oxidation resistant coating on a silicon nitride- or silicon carbide-based substrate body. A gas mixture is passed over the substrate at about 900.degree.-1500.degree. C. and about 1 torr to about ambient pressure. The gas mixture includes one or more halide vapors with other suitable reactant gases. The partial pressure ratios, flow rates, and process times are sufficient to deposit a continuous, fully dense, adherent coating. The halide and other reactant gases are gradually varied during deposition so that the coating is a graded coating of at least two layers. Each layer is a graded layer changing in composition from the material over which it is deposited to the material of the layer and further to the material, if any, deposited thereon, so that no clearly defined compositional interfaces exist. The gases and their partial pressures are varied according to a predetermined time schedule and the halide and other reactant gases are selected so that the layers include (a) an adherent, continuous intermediate layer about 0.5-20 microns thick of an aluminum nitride or an aluminum oxynitride material, over and chemically bonded to the substrate body, and (b) an adherent, continuous first outer layer about 0.5-900 microns thick including an oxide of aluminum or zirconium over and chemically bonded to the intermediate layer.

REFERENCES:
patent: 4312899 (1982-01-01), Lahmann
patent: 4449989 (1984-05-01), Sarin et al.
patent: 4619866 (1986-10-01), Smith et al.
patent: 4702970 (1987-10-01), Sarin et al.
patent: 4756976 (1988-07-01), Komeya et al.

Affiliated with

Also associated with

Rating

Process for the deposition of high temperature stress and oxidat does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for the deposition of high temperature stress and oxidat, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the deposition of high temperature stress and oxidat will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1541883