Process for the decomposition of halogenated organic compounds

Mineral oils: processes and products – Refining – Halogen contaminant removal

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

585469, 210909, 423240, C10G 2904

Patent

active

047612215

ABSTRACT:
A process for the decomposition of a halogenated organic compound which comprises contacting the compound with a polyglycol and an alkali or alkaline-earth hydride, optionally in the presence of an alkali salt, at a temperature which does not exceed 100.degree. C., and under an atomosphere having a reduced oxygen content.
The process is particularly useful for the decontamination of industrial oils containing chlorinated biphenyls because the treated oil is not degraded during the decontamination process.

REFERENCES:
patent: 2164334 (1939-07-01), Marks
patent: 3539653 (1970-11-01), Fevel et al.
patent: 4284516 (1981-08-01), Parker et al.
patent: 4327027 (1982-04-01), Howard et al.
patent: 4337368 (1982-06-01), Pytlewski et al.
patent: 4351718 (1983-09-01), Bruenelle
patent: 4400566 (1983-08-01), Colon
patent: 4417091 (1983-11-01), Gaillard
patent: 4417977 (1983-11-01), Pytlewski et al.
patent: 4430208 (1984-02-01), Pytlewski et al.
patent: 4447262 (1984-05-01), Gay et al.
patent: 4602994 (1986-07-01), Pytlewski et al.
patent: 4618686 (1986-10-01), Boyer
patent: 4623448 (1986-11-01), O'Connell et al.
patent: 4639309 (1987-01-01), Lalancetle et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for the decomposition of halogenated organic compounds does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for the decomposition of halogenated organic compounds, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for the decomposition of halogenated organic compounds will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-710588

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.