Optical: systems and elements – Lens – With support
Reexamination Certificate
1999-06-18
2001-03-06
Epps, Georgia (Department: 2873)
Optical: systems and elements
Lens
With support
C359S819000
Reexamination Certificate
active
06198579
ABSTRACT:
CROSS-REFERENCES TO RELATED APPLICATIONS
Not applicable.
STATEMENT REGARDING FEDERALLY SPONSORED RESEARCH OR DEVELOPMENT
Not applicable.
BACKGROUND OF THE INVENTION
1. Field of the Invention
The invention relates to a process for the correction of non-rotationally-symmetrical image errors in an assembly with optical elements. The invention furthermore relates to an objective with optical elements, particularly lenses, and with a cooling device. Furthermore, the invention relates to a projection exposure device for microlithography.
2. Discussion of Relevant Art
It is known that lens heating effects lead, among other things, to non-rotationally-symmetrical temperature distributions in optical elements, particularly in lenses for semiconductor lithography objectives. Non-rotationally-symmetrical temperature distributions give rise to image errors, however, such as astigmatism in the axis and anamorphism in the distortion (&Dgr;&bgr;).
A static state of a non-rotationally-symmetrical temperature distribution could be corrected by suitable geometric arrangements of heat-sinking contact places, particularly on the lens periphery. However, it was found that the lens heating effects have a very marked dynamic behavior. In particular, the amplitudes of the effects are very strongly time-dependent, while the time constants are relatively long, and indeed are of the order of several minutes. For this reason, it is necessary to provide a dynamic or variably adjustable temperature distribution which can quickly and reliably oppose the non-rotationally-symmetrical temperature distributions in the optical element, in order to eliminate the said optical image errors.
Measures for the correction of rotationally asymmetric optical effects due to irradiation are already known from U.S. Pat. No. 5,805,273 European Patent EP 0 678 768. There are named for this purpose, among other things, measures for the production of rotationally symmetrical temperature distributions, for which cooling and heating devices, e.g., resistance wires and gas streams, are proposed. The production of rotationally symmetrical temperature distributions is however not an unconditional prerequisite for being able to compensate lens heating effects. The prior art device is however firstly relatively intricate and costly, and secondly, does not permit sufficient dynamics as regards changes of the temperature distribution.
SUMMARY OF THE INVENTION
The present invention therefore has as its object to provide a process for the correction of non-rotationally-symmetrical image errors with an assembly, for example, an objective with optical elements, whereby dynamic or variably adjustable temperature distributions can be produced in an optical element with simple measures, for the compensation of the negative lens heating effects, wherein these temperature distributions are to be quickly and reliably attained with simple measures.
According to the invention, this object is attained by the following process steps: arranging a plurality of Peltier elements distributed over the periphery of at least one optical element, electrically driving said Peltier elements differently from each other in order to affect a temperature distribution in said optical element, and providing heat-conducting connections between said Peltier elements and said optical element.
Namely it has been found in a surprising manner that Peltier elements are particularly suitable for the solution of the stated object, when they are used according to the measures according to the invention.
It is well known that in Peltier elements a current flow through a contact place between two different materials leads to a cooling of the contact place, and on the other hand reversal of the current flow leads to a heating of the contact place.
It is indeed already known to make use of this effect of Peltier elements for the cooling of devices (see, e.g., WO 97/14077 for wafer chucks), but since the amount of heat to be carried away from a projection exposure device for microlithography is very large, namely in the region of watts, it was assumed that Peltier elements would not be sufficient to eliminate such lens heating effects.
It has however been found that with a corresponding number of Peltier elements in combination with specific driving, a dynamically adjustable temperature distribution can be quickly and reliably set such that the disadvantageous action of the lens heating effects can be eliminated. Also, the relatively high incident amount of heat can be carried away within a short time. Namely, it was established that the partially rapid dynamic behavior of the lens heating effects can be optimally countered by the specific controllability of Peltier elements and their bidirectional capability, i.e., their changeover between cooling and heating. Peltier elements can be changed over between cooling and heating by reversing the polarity of the electrical supply. This means that a very quick and exact reaction to temperature differences and changing temperature distributions can be effected without the interposition of mechanically movable components.
The process according to the invention enables the desired temperature distributions to be quickly and reliably attained with simple measures. This is in particular the case when only given image errors, e.g., image errors of low order, are to be corrected.
A further very important advantage of the invention is that if needed, “over-compensations” and the additional compensation of manufacturing errors are possible. Instead of symmetrizing several lenses, as it the case according to the state of the art, individual lenses can also be “over-compensated”, i.e., the temperature distribution or deformation can intentionally be made asymmetrical “in another direction”. An overall compensation of the whole objective or of the exposure device results in this manner.
As regards the compensation of manufacturing errors, there are two variants, namely a simultaneous compensation of accidental manufacturing errors and an intentional introduction of a fixed offset, in order to halve the required amounts of correction.
A simultaneous compensation of lens heating and of compaction effects of the optical element is also possible with the process according to the invention.
A constructive solution for carrying out the process according to the invention in an assembly, e.g., an objective with optical elements, particularly lenses, is a temperature adjusting device comprising a plurality of Peltier elements distributed over the periphery of at least one of optical element and electrically driven differently from each other, and heat-conducting connecting members arranged between said Peltier elements and said optical element.
The Peltier elements can be thereby arranged regularly or else irregularly over the periphery of the optical element. It is important that they are optionally or differently driven electrically, in order to be able to affect the temperature distribution in the optical element in the desired manner. It is then solely necessary to take care that connecting members of very good thermal conducting properties are provided between the Peltier elements and the optical element, so that a good conduction of heat or cold is attained between the Peltier elements and the optical element.
Various solutions are conceivable for the embodiment of the heat-conducting connecting members. The mount or holder of the optical element can be used in a simple manner for this purpose. It is likewise also possible to arrange the Peltier elements separately from a mount or holder and to provide corresponding heat-conducting connecting members between the Peltier elements and the optical element.
The Peltier elements are additionally provided with corresponding heat coupling members to carry off the removed heat to the exterior.
REFERENCES:
patent: 5099355 (1992-03-01), Tomita
patent: 5243611 (1993-09-01), Hyuga et al.
patent: 5353292 (1994-10-01), Motegi
patent: 5668826 (1997-09-01), Bezinge et al.
patent: 5671307 (1997-09-01), Lauzon et al.
Carl-Zeiss-Stiftung
Epps Georgia
Seyrafi Saeed
LandOfFree
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