Process for the cleavage of chlorosiloxanes

Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing

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423325, 423341, 423342, C01B 3308, C01B 3312

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active

047190930

ABSTRACT:
Disclosed is a process for the cleavage of chlorosiloxanes in the gas phase at temperatures between 350 and 1450.degree. C. to form chlorosilanes and silicon dioxide as reaction products. The claimed process is preferably performed in the presence of metallic silicon or ferrosilicon. The procedure can be combined with the large-scale technical production of chlorosilanes by the chlorination or hydrochlorination of silicon. The inventive process makes it possible to perform the chlorination or hydrochlorination of silicon with the formation of chlorosilanes in an increased yield while reducing the formation of by-products.

REFERENCES:
patent: 4585646 (1986-04-01), Gomberg
Chemical Abstracts, vol. 95, No. 15, 10/12/81, 132524v, Cleavage of Siloxanes, Koetzsch et al.
Chemical Abstracts, vol. 83, No. 12, 9/22/75, 107756s, Composition of High Boiling Fractions from Direct Synthesis of Trichlorosilane, Lerny et al.
Chemical Abstracts, vol. 89, No. 5, 7/31/78, 43752b, Conversion of Organosiloxanes, Frey et al.

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