Process for the chemical cleaning of metal components

Details Process for the chemical cleaning of metal components Process for the chemical cleaning of metal components

1994-07-29

1996-11-19

El-Arini, Zeinab

Cleaning and liquid contact with solids

Processes

For metallic, siliceous, or calcareous basework, including...

134 3, 134 41, 510247, 510253, 510270, 510257, 510245, 510505, 510508, C23G 100, C23G 102, C02F 508, C02F 512

Patent

active

055758630

ABSTRACT:
A process for chemical cleaning of metal components having an iron oxide deposit upon a layer of compounds having a high silica content. The process includes the step of preparing an aqueous mixture including an agent for complexing Si(OH).sub.4 and at least one compound for dissolving the high silica content layer. The dissolving compound is selected from the group consisting of insertion compounds for inserting OH or F ions in the Si(OH).sub.4 and OH-containing organic compounds. The insertion compounds including electrophilic groups and are selected from the group consisting of conjugated unsaturated systems and unsaturated N-oxide compounds. The OH-containing organic compounds are selected from the group consisting of organic compounds having at least one alcohol function, aromatic amines, soluble salts of tertiary amines, and aromatic amines causing condensation of OH radicals onto silica. The process also includes the step of contacting the metal component with the aqueous medium until the high silica content layer has been dissolved.

REFERENCES:
patent: 3148150 (1964-09-01), De Groote et al.
patent: 3664870 (1972-05-01), Oberhofer et al.
patent: 4666528 (1987-05-01), Arrington et al.
patent: 4793865 (1988-12-01), Staley et al.
patent: 5322636 (1994-06-01), Schaper
Patent Abstracts of Japan--vol. 7, No. 191 (C-182) (1336) Aug. 20, '83 & JP-A-58 092 499 (Nippon Noyaku) Jun. 1, 1983--Abstract-.
Patent Abstracts of Japan--vol. 11, No. 242 (C-438) (2689) Aug. 7, '87 & JP-A-62 050 489 (Kawasaki Steel) Mar. 5, 1987--Abstract-.
Patent Abstracts of Japan--vol. 4, No. 173(C-32) (655) Nov. 29, '80 & JP-A-55 109 498 (Ichirou Kudou) Aug. 22, 1980--Abstract-.
Patent Abstracts of Japan-vol. 8, No. 118(C-226) (1555) May 31, '84 & JP-A-59 029 093 (Doryokuro Kakunenryo Kaihatsu) Feb. 16, 1984 --Abstract-.

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