Process for the addition of boron in a TiO.sub.2 manufacturing p

Compositions: coating or plastic – Materials or ingredients – Pigment – filler – or aggregate compositions – e.g. – stone,...

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106442, 106444, 106446, 423613, 423592, C09C 136

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active

057282056

ABSTRACT:
The present invention provides a process for producing titanium dioxide (TiO.sub.2) pigment comprising boron oxide (B.sub.2 O.sub.3), comprising the steps of: (a) reacting titanium tetrachloride (TiCl.sub.4) in the vapor phase with an aluminum compound and an oxygen-containing gas in a reactor at a temperature in the range of about 900.degree. C. to about 1600.degree. C. to provide a gaseous suspension comprising TiO.sub.2 particles, and (b) contacting the gaseous suspension comprising the TiO.sub.2 particles with a boron compound to produce TiO.sub.2 pigment comprising B.sub.2 O.sub.3.

REFERENCES:
patent: 2512079 (1950-06-01), Werner
patent: 3433594 (1969-03-01), Wilson et al.
patent: 3443897 (1969-05-01), Wilson et al.
patent: 3642442 (1972-02-01), Hoekje et al.
patent: 4781761 (1988-11-01), Jacobson
patent: 5562764 (1996-10-01), Gonzales
M. Kamal Akhtar, Sotiris E. Pratsinis, Sebastian V. R. Mastrangelo, "Dopants in Vapor-Phase Synthesis of Titania Powders", Journal of the American Ceramic Society, 75, No. 12, 3408-3416, Dec. 1992.

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