Process for surface work strain relief of electrooptic crystals

Chemistry of inorganic compounds – Phosphorus or compound thereof – Oxygen containing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

156 16, 156 17, 350160R, 350150, 423593, G02B 520

Patent

active

039549402

ABSTRACT:
An electrooptic crystal having improved characteristics including an improved light extinction ratio and a process of making same including etching certain portions of the lateral surfaces thereof so as to relieve surface and other strain in the crystal.

REFERENCES:
patent: 3404049 (1968-10-01), Shanefield et al.
patent: 3421962 (1969-01-01), Topas
patent: 3528765 (1970-09-01), Fay et al.
patent: 3841930 (1974-10-01), Hetrich
patent: 3860467 (1975-01-01), Lim
"Better Laser Modulation Sought," Electronic Design 22 (Sept. 27, 1966), pp. 51-55.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for surface work strain relief of electrooptic crystals does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for surface work strain relief of electrooptic crystals, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for surface work strain relief of electrooptic crystals will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-680714

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.