Organic compounds -- part of the class 532-570 series – Organic compounds – Heterocyclic carbon compounds containing a hetero ring...
Patent
1992-11-24
1994-06-07
Daus, Donald G.
Organic compounds -- part of the class 532-570 series
Organic compounds
Heterocyclic carbon compounds containing a hetero ring...
548260, C07D24920
Patent
active
053190912
ABSTRACT:
A composition that, when present in a polymer matrix, reduces the deleterious effect of UV light absorption by the polymer is provided, which comprises a sulfur-containing derivative of hydroxyphenylbenzotriazole having the formula of: ##STR1## wherein each X is selected from the group consisting of hydrogen, halogens, cyano, alkyl, phenyl group, biphenyl group, arylthio, amine, ketone, aldehyde, alkoxy, hydroxy, carboxylic acid group, oligomer and combinations thereof and can have carbon atoms up to about 20; n is a whole number from 1 to 5; n' is a whole number from 0 to 4; n" is a whole number from 1 to 2 and each n" can be the same or different; q is an integer from 1 to 10; each Y is selected from the group consisting of --S(O) (O)--, --S(O)--, and --S--; each R can be selected from the group consisting of hydrogen, alkyl group, alkenyl group, aralkyl group, alkaryl group, and combinations thereof and can have 0 to about 10 carbon atoms; each OH group can be at either the 2'- or the 6'-position, or both. Also provided are a composition comprising the sulfur-containing derivative, a process for preparing the derivative, a composition comprising a polymer chemically bonded to the derivative, and a process for preparing the composition which comprises a polymer chemically bonded to the derivative.
REFERENCES:
patent: 3004896 (1961-10-01), Heller et al.
patent: 3849499 (1974-11-01), Malievsky et al.
patent: 4609712 (1986-09-01), Evans et al.
patent: 4853471 (1989-08-01), Rody et al.
patent: 4871793 (1989-10-01), Nakahara et al.
Cornforth Frederick J.
Das Paritsoh K.
DesLauriers Paul J.
Fahey Darryl R.
Daus Donald G.
Phillips Petroleum Company
Shay Lucas K.
LandOfFree
Process for sulfur containing derivatives of hydroxyphenyl/benzo does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for sulfur containing derivatives of hydroxyphenyl/benzo, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for sulfur containing derivatives of hydroxyphenyl/benzo will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-793773