Process for stripping resist layers from substrates

Details Process for stripping resist layers from substrates Process for stripping resist layers from substrates

1976-10-29

1978-03-07

Lusignan, Michael R.

Coating processes

With post-treatment of coating or coating material

Chemical agent applied to treat coating

96 351, 134 38, 156626, 156668, 252 795, 252364, 427259, 427272, 427273, B44D 144, B08B 700, C23D 1700

Patent

active

040781020

ABSTRACT:
Organic polymer resist layers are stripped from substrates by treating the layers with a mixture of an aldehyde or a ketone and an alcoholic solution of a compound selected from the group consisting of ammonium, alkali metal, and alkaline earth metal hydroxides and carbonates.

REFERENCES:
patent: 3625763 (1971-12-01), Melillo
patent: 3813309 (1974-05-01), Bakos et al.
patent: 3871929 (1975-03-01), Schevey et al.
patent: 3930857 (1976-01-01), Bendz et al.
patent: 3980587 (1976-09-01), Sullivan
patent: 3988256 (1976-10-01), Vandermey et al.
IBM Technical Disclosure Bulletin, Photo Resist Stripper, vol. 16, No. 6, Nov., 1973, p. 1917.

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