Process for stripping photoresist while producing liquid crystal

Details Process for stripping photoresist while producing liquid crystal Process for stripping photoresist while producing liquid crystal

1995-01-17

1997-05-27

Breneman, R. Bruce

Semiconductor device manufacturing: process

Making device or circuit emissive of nonelectrical signal

Including integrally formed optical element

134 13, 134 2, 134 38, 510176, 438951, 438158, B08B 308, B08B 310, H01L 21335

Patent

active

056331754

ABSTRACT:
A liquid crystal display device is produced by effecting in the course of its production steps a resist-peeling method including the steps of (a) changing the quality of a resist layer on a substrate, (b) contacting the changed resist with a liquid containing 2-amino-1-ethanol, and (c) removing the liquid containing the thus peeled resist from the surface of the etched resist, and optionally, (d) regenerating a liquid containing 2-amino-1-ethanol by distillation from the liquid used in step (c) and reusing the regenerated liquid in step (b).

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patent: 5032531 (1991-07-01), Tsutsui et al.
patent: 5070379 (1991-12-01), Nomoto et al.

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