Process for stripping light-hardened photoresist layers

Details Process for stripping light-hardened photoresist layers Process for stripping light-hardened photoresist layers

1986-08-22

1988-10-11

Sneed, Helen M. S.

Cleaning and liquid contact with solids

Processes

Paints, varnishes, lacquers, or enamels, removal

134 2, 134 29, 430329, 430331, 252547, 252156, 252DIG8, B08B 700, B08B 3000, C03C 2300, G03C 500

Patent

active

047768924

ABSTRACT:
Light-hardened photoresist layers are stripped by treating the layer with an aqueous solution of an organic quaternary ammonium base and, optionally a strong inorganic base. The resulting layer residues are dispersed as relatively small flakes which do not become lodged between conducting paths.

REFERENCES:
patent: 3673099 (1972-06-01), Corby et al.
patent: 4078102 (1978-03-01), Bendz et al.
patent: 4089704 (1978-05-01), Heiss, Jr. et al.
patent: 4202703 (1980-05-01), Zuber et al.
patent: 4239661 (1980-12-01), Muraoka et al.
patent: 4518675 (1985-05-01), Kataoko
patent: 4556629 (1985-12-01), Paulin et al.
patent: 4610953 (1986-09-01), Hashimoto
patent: 4628023 (1986-12-01), Cawston et al.
Patent Abstracts of Japan, vol. 5, No. 91 (E-61) [763], Jun. 13, 1981.

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