Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2011-03-08
2011-03-08
Huff, Mark F (Department: 1721)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C065S028000
Reexamination Certificate
active
07901843
ABSTRACT:
There is provided a process for smoothing a substrate surface having a concave defect, such as a pit or a scratch. A process for smoothing a surface of a glass substrate for a reflective mask blank used in EUV lithography, comprising disposing a thin film on a glass substrate; detecting a concave defect existing on the glass substrate; and locally heating or locally anodizing a portion of the thin film just above the detected concave defect to perform a chemical reaction accompanied by a volume increase in a material forming the thin film.
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International Organization for Standardization, et al., “Specification for Extreme Ultraviolet Lithography Mask Substrates”, SEMI P37-1102, SEMI 2001, 2002, pp. 1-10.
American Society for Quality Control, et al., “Specification for Absorbing Film Stacks and Multilayers on Extreme Ultraviolet Lithography Mask Blanks”, SEMI P38-1102, SEMI 2002, pp. 1-8.
Alan Stivers, et al., “Evaluation of the Capability of a Multibeam Confocal Inspection System for Inspection of EUVL Mask Blanks”, 22ndAnnual BACUS Symposium on Photomask Technology, Proceedings of SPIE, vol. 4889, 2002, pp. 408-417.
Ikuta Yoshiaki
Ito Masabumi
Sugiyama Takashi
Alam Rashid
Asahi Glass Company Limited
Huff Mark F
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
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