Process for slurry polymerization of propylene oxide with high c

Chemistry of carbon compounds – Miscellaneous organic carbon compounds

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

526 69, 526 70, 526208, 526237, 526266, 526320, C08G 6508, C08G 6510, C08G 6530

Patent

active

039576973

ABSTRACT:
A propylene oxide slurry polymerization process having high catalyst efficiency comprises (A) homopolymerizing or copolymerizing propylene oxide in isobutane in the presence of a catalyst substantially soluble in isobutane, (B) separating isobutane with catalyst dissolved therein from propylene oxide polymer, and (C) recycling isobutane and dissolved catalyst for further polymerization. The catalyst comprises (1) at least one trialkylaluminum compound wherein each alkyl group contains from 2 to 10 carbon atoms, (2) at least one diketone containing from 5 to 20 carbon atoms and (3) water. The catalyst may also contain (4) at least one dialkyl ether or cycloalkyl ether containing from 2 to 12 carbon atoms and/or (5) at least one ether alcohol containing from 2 to 12 carbon atoms.

REFERENCES:
patent: 2482056 (1949-09-01), Elwell et al.
patent: 3135705 (1964-06-01), Vandenberg
patent: 3275573 (1966-09-01), Vandenberg
patent: 3280045 (1966-10-01), Vandenberg
patent: 3285861 (1966-11-01), Vandenberg
patent: 3642667 (1972-02-01), Steller
Condensed Chemical Dictionary, 5th Edition, Reinhold, N.Y. (1956), p. 989.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Process for slurry polymerization of propylene oxide with high c does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Process for slurry polymerization of propylene oxide with high c, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for slurry polymerization of propylene oxide with high c will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2234461

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.