Process for simultaneous development and etch of photoresist and

Details Process for simultaneous development and etch of photoresist and Process for simultaneous development and etch of photoresist and

1973-10-03

1976-03-16

Klein, David

Gas separation: apparatus

Electric field separation apparatus

Electrode cleaner, apparatus part flusher, discharger, or...

96 362, 96 48R, 156 8, 156 13, 156 15, G03C 500

Patent

active

039444210

ABSTRACT:
Photoresists are developed and the supporting substrate is etched simultaneously therewith by bringing the resist (after exposure) into physical contact with a fluid containing a developer for the resist and an etchant for the supporting substrate.

REFERENCES:
patent: 3019106 (1962-01-01), Adams
patent: 3399994 (1968-09-01), Watkinson
patent: 3639185 (1972-02-01), Colom
patent: 3698904 (1972-10-01), Fukui et al.

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