Process for shallow relief printing

Details Process for shallow relief printing Process for shallow relief printing

1975-12-23

1977-02-01

Coughenour, Clyde I.

Printing

Antismut device

Anti-offset material application

101170, 101350, 101395, 1014011, 101471, B41M 102, B41N 112, B41F 3122

Patent

active

040056546

ABSTRACT:
A printing process is provided whereby a resilient image having a relief of from about 4 to 50 microns is formed on the surface of a hard, non-resilient substrate to form a printing member. The printing member is then contacted with a gravure donor member having disposed therein a liquid developer wherein said developer resides within cells from about 4 to 50 microns below the surface of the contact plane at a depth such that the developer contacts the image but not the non-imaged areas of the master so that said contacting selectively transfers said developer to said resilient image but not to the non-imaged areas, and the printing member is then contacted with a receiver sheet to transfer the developed image.

REFERENCES:
patent: 2247540 (1941-07-01), Yanes
patent: 2310788 (1943-02-01), Hommelchen
patent: 2878096 (1959-03-01), Wood et al.
patent: 3093071 (1963-06-01), Taylor
patent: 3223838 (1965-12-01), Hoshino et al.
patent: 3455239 (1969-07-01), Smith
patent: 3613578 (1971-10-01), Heurich
patent: 3645204 (1972-02-01), Gosnell

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