Coating processes – Measuring – testing – or indicating
Patent
1994-09-13
1995-09-19
Pianalto, Bernard
Coating processes
Measuring, testing, or indicating
427 99, 427255, 4272554, 427399, 427583, 427595, B05D 512
Patent
active
054514258
ABSTRACT:
A silicon chip which is used as a microresonator, filter or the like and which may include an integrated circuit, has its resonant frequency adjusted by increasing its thickness in an ozone-rich atmosphere which may be supplemented by ultraviolet light and/or heat. The process lends itself to low cost, mass production techniques.
REFERENCES:
Clark T. -C. Nguyen and Roger T. Howe, "Design and Performance of CMOS Mimechanical Resonator Oscillators," 1994 IEEE International Frequency Control Symposium (No Month Available).
Roger T. Howe, "Applications of Silicon Micromachining to Resonator Fabrication," 1994 IEEE Internation Frequency Control Symposium (No Month Available).
O'Meara John M.
Pianalto Bernard
The United States of America as represented by the Secretary of
Zelenka Michael
LandOfFree
Process for setting the frequency of a silicon microresonator does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for setting the frequency of a silicon microresonator, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for setting the frequency of a silicon microresonator will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1826957