Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Carbon dioxide or hydrogen sulfide component
Patent
1982-01-18
1983-09-20
Thomas, Earl C.
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
Carbon dioxide or hydrogen sulfide component
423228, 423229, 252189, 252190, B01D 5334
Patent
active
044055803
ABSTRACT:
The selective removal of H.sub.2 S gas from a normally gaseous mixture containing H.sub.2 S and CO.sub.2 is accomplished by contacting the gaseous mixture with an absorbent solution comprising a tertiary amino azabicyclic alcohol whereby H.sub.2 S is selectively absorbed from the mixture.
REFERENCES:
patent: 2712978 (1955-07-01), Blohm
patent: 3364239 (1968-01-01), Speranza
patent: 3398197 (1968-08-01), Miller, Jr. et al.
patent: 3449432 (1969-06-01), Borstlap et al.
patent: 3478096 (1969-11-01), Cyba
patent: 3658744 (1972-04-01), Renault et al.
patent: 3962238 (1976-06-01), Mauvernay et al.
patent: 4016115 (1977-05-01), Miyake et al.
patent: 4057403 (1977-11-01), Valdes
patent: 4112051 (1978-09-01), Sartori et al.
patent: 4112052 (1978-09-01), Sartori et al.
patent: 4143119 (1979-03-01), Asperger et al.
patent: 4208385 (1980-06-01), Robbins et al.
patent: 4291004 (1981-09-01), McCaffrey et al.
Frazier and Kohl, Ind. and Eng. Chem. 42, No. 11 (1950).
F. Goodridge, Trans. Faraday Soc., 51, 1703-1709 (1955).
V. Laan, Eesti NSV Tead. Akad. Toim., Keem., 28, 272-277 (1979) (abstract only).
V. Laan et al., Eesti NSV Tead. Akad. Toim., Keem., 28, 84-90 (1979) (abstract only).
H. Schiefer et al., Z. Chem., 22, 426 (1982)-abstract only.
W. Gerhardt et al., J. Prakt. Chem., 319, 714-12 (1977)-abstract only.
V. Laan et al., Eesti NSV Tead. Akad. Toim., Keem., 29, 113-17 (1980)-abstract only.
Sartori Guido
Savage David W.
Stogryn Eugene L.
Exxon Research and Engineering Co.
Halluin Albert P.
Hasak Janet
Thomas Earl C.
LandOfFree
Process for selective removal of H.sub.2 S from mixtures contain does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for selective removal of H.sub.2 S from mixtures contain, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for selective removal of H.sub.2 S from mixtures contain will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-587615