Process for removing total reduced sulfur compounds from gaseous

Details Process for removing total reduced sulfur compounds from gaseous Process for removing total reduced sulfur compounds from gaseous

1993-12-30

1995-05-23

Langel, Wayne A.

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

423224, 423225, 423231, 4232421, 42324301, 42324307, 4235765, C01B 1700, C01B 1716

Patent

active

054179467

ABSTRACT:
A process for removing Total Reduced Sulfur compounds from a gaseous stream such as those containing natural gas, industrial gas, and digester gas by oxidation with a fine flocculent acidic catalyst slurry which is regenerable during the process by pH adjustment in the absence of added heat. The catalyst slurry comprises MnO.sub.2, Mn.sub.2 O.sub.3, and Mn.sub.3 O.sub.4 having pH in the range from about 0.5 to about 6.5 and is prepared by oxidizing a divalent manganous salt in an aqueous solution having a pH in the range from about 8.0 to about 13.5 with an oxygen-containing gaseous stream.

REFERENCES:
patent: 3793171 (1974-02-01), Zabolotny et al.
patent: 4076793 (1978-02-01), Nikolai
patent: 4235853 (1980-11-01), Nikolai
patent: 4310497 (1982-01-01), Deschamps et al.
patent: 4552734 (1985-11-01), Iannicelli et al.
patent: 4552735 (1985-11-01), Iannicelli et al.
patent: 4713225 (1987-12-01), Iannicelli
patent: 4822576 (1989-04-01), Chu
patent: 4824645 (1989-04-01), Jones et al.
patent: 4880609 (1989-11-01), Naraghi
patent: 4892718 (1990-01-01), Peter et al.
patent: 4923688 (1990-05-01), Iannicelli
patent: 4925569 (1990-05-01), Chou et al.
patent: 5147620 (1992-09-01), Rozsa

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