Radiation imagery chemistry: process – composition – or product th – Nonradiation sensitive image processing compositions or... – Developer
Reexamination Certificate
2005-05-10
2005-05-10
Le, Hoa Van (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Nonradiation sensitive image processing compositions or...
Developer
C430S933000
Reexamination Certificate
active
06890706
ABSTRACT:
A process for removing stain in a photographic material is described which process comprises incorporation of at least one compound of the formula (I)whereinX is O or NH;n is 1 or 2,p is 0, 1 or 2,M is hydrogen, an alkali metal atom, ammonium or a cation formed from an amine;each R1, independently, is an aminoacid residue from which a hydrogen atom on the amino group has been removed;each R2, independently, is hydrogen, C1-C8alkyl, C1-C8alkoxy, halogen, cyano, COOR, whereinR is hydrogen or C1-C3alkyl, CONH—R in which R has its previous significance, SO2NH—R in which R has its previous significance, NH—COR in which R has its previous significance, or SO3M,whereinM has its previous significance, or, ifn is 1,R2can also be CO—R3in which R3is C1-C3alkyl or phenyl, in that photographic material.
REFERENCES:
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patent: 4587195 (1986-05-01), Ishikawa et al.
patent: 6210449 (2001-04-01), Rohringer et al.
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Chem. Abstr. 71:126005 for NL 6714386 (1969).
Patent Abstracts of Japan Publication No. 62106965 (1987).
Bulliard Christophe
Megert Sonia
Metzger Georges
Ciba Specialty Chemicals Corporation
Le Hoa Van
Mansfield Kevin T.
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