Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Nitrogen or nitrogenous component
Patent
1982-06-28
1984-04-24
Heller, Gregory A.
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
Nitrogen or nitrogenous component
423239, 423242, 423244, 423561R, 423561A, 423571, C01B 2100, C01B 1700
Patent
active
044447361
ABSTRACT:
A process for removing SO.sub.2 and NO.sub.x from waste gas and recovering sulfur comprising scrubbing the waste gases with a water slurry of FeS in the presence of FeSO.sub.4 and Na.sub.2 SO.sub.4. SO.sub.2 is captured by the formation of FeS.sub.2 and FeSO.sub.4 in the scrubber. By thermal regeneration in a reducing atmosphere the FeS.sub.2 is converted to FeS and Na.sub.2 SO.sub.4 to Na.sub.2 S. The FeS is recycled to the scrubber. The Na.sub.2 S is returned to the system reacting with FeSO.sub.4 to form Na.sub.2 SO.sub.4 and FeS. The last reaction reduces the amount of FeSO.sub.4 entering the regenerator where by an undesirable side reaction, it may be partially converted to SO.sub.2 and Fe.sub.3 O.sub.4.
REFERENCES:
patent: 1062120 (1913-05-01), Sanborn et al.
patent: 1976704 (1934-10-01), Ward et al.
patent: 3695828 (1972-10-01), Gertsen et al.
patent: 3784680 (1974-01-01), Strong et al.
patent: 3920421 (1975-11-01), Collin
patent: 4008169 (1977-02-01), McGauley
patent: 4130628 (1978-12-01), Barnes
Thermal Decomposition of Iron Sulphates II, Huuska et al., J. Appl. Chem. Biotechnol., 1976, 26, 729-734.
Heller Gregory A.
Pittsburgh Environmental Systems Incorporated
LandOfFree
Process for removing SO.sub.2 and NO.sub.x from gases does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for removing SO.sub.2 and NO.sub.x from gases, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for removing SO.sub.2 and NO.sub.x from gases will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-115260