Process for removing residues from a semiconductor substrate

Details Process for removing residues from a semiconductor substrate Process for removing residues from a semiconductor substrate

1997-09-23

2000-03-07

Utech, Benjamin

Semiconductor device manufacturing: process

Chemical etching

Liquid phase etching

510175, 510176, 510255, H01L 213105, H01L 21312

Patent

active

060339934

ABSTRACT:
A process of treating a substrate having photoresist applied thereto, comprising the steps of:

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patent: 5472830 (1995-12-01), Honda
patent: 5529637 (1996-06-01), Honda et al.
patent: 5612304 (1997-03-01), Honda et al.
patent: 5878406 (1998-07-01), Honda et al.

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