Process for removing residue from screening masks with alkaline

Details Process for removing residue from screening masks with alkaline Process for removing residue from screening masks with alkaline

1997-02-28

1999-03-30

Pyon, Harold Y.

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

134 2, 134 29, 134 38, 134 40, 510175, 510421, 510424, 510435, B08B 312, C23G 114

Patent

active

058883088

ABSTRACT:
This invention relates to the use of water-based cleaning solutions and their use as environmentally safe replacements of chlorinated hydrocarbon solvents to remove metal-polymer composite paste residue from screening masks and ancillary equipment, such as, used for screening a conductive metal pattern on a ceramic green sheet in the manufacture of multi-layer ceramic products.

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