Process for removing plating materials from copper-based substra

Electrolysis: processes – compositions used therein – and methods – Electrolytic synthesis – Preparing organic compound

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205610, 216 93, 216106, 216108, C23F 100

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active

057559503

ABSTRACT:
An improved method for stripping or removing tin or tin/lead plating materials from copper-based alloys is provided. This method is essentially a two-stage process whereby the bulk of the plating layer is removed in the first stage and the remaining intermetallic layer (i.e., the interface between the copper-based substrate and the plating materials) is removed in the second stage. The first stage uses an aqueous etchant solution containing either sulfuric acid and nitric or an alkane sulfonic acid and nitric acid. An aqueous immersion solution containing either sulfuric acid and copper (II) ions or an alkane sulfonic acid and copper (II) ions (which can form complexes with the alkane sulfonic acid such as copper mesylate) is used in the second stage to remove the remaining intermetallic layer. The copper-based substrate, after rinsing with water and is drying (if appropriate), can then be treated using conventional metal-recycling procedures. If desired, tin or tin/lead (as well as other components) can be recovered from the aqueous etchant and immersion solutions and, if desired, recycled. Recovered sulfonic acid (either sulfuric acid or alkane sulfonic acids) from the aqueous etchant and immersion solutions can also be recycled in the process.

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