Process for removing olefinic impurities from 2H-heptafluoroprop

Details Process for removing olefinic impurities from 2H-heptafluoroprop Process for removing olefinic impurities from 2H-heptafluoroprop

1996-03-19

1997-04-15

Evans, Joseph E.

Organic compounds -- part of the class 532-570 series

Organic compounds

Halogen containing

C07C 1738, C07C 17389, C07C 1908

Patent

active

056211520

ABSTRACT:
Process for removing olefinic impurities from 2H-heptafluoropropane (R 227).
The invention relates to a process for removing olefinic impurities from 2H-heptafluoropropane (R 227) by passing the contaminated R 227 in the gas phase at from -20.degree. to 100.degree. C. over aluminum oxide.

REFERENCES:
patent: 2909570 (1959-10-01), Wade et al.
patent: 3026359 (1962-03-01), Mastrangelo et al.
patent: 3696156 (1972-10-01), Weeks
patent: 5300714 (1994-04-01), Pothapragada et al.

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